NanoFabrication Facility

The NanoFabrication Facility offers a comprehensive set of tools to develop micro and nanoscale materials devices, such as integrated circuits, nanophotonic and solid state devices, microelectro-mechanical systems, and microfluidic systems. The NanoFab features 5,000 square feet of mixed class 100, 1,000, and 10,000 cleanroom space.

Instrumentation

Back End:

Dicing Saw

Spin Rinse Dryer

Wire Bonder

Deposition:

Atomic Layer Deposition

E-beam Evaporator

Furnace LPCVD

PECVD

Sputter

Thermal Evaporator

Etching:

ICP Cl

ICP Fl/DRIE

Plasma Asher

RIE

Vapor HF

XeF2

Lithography:

E-beam Lithography

3D Lithography System

Mask Aligner

Spin Coaters

UV Ozone Cleaner

Metrology:

AFM

Ellipsometer

Filmetrics

3D Optical Profiler

Probe Station

SEM

Stylus Profiler

Furnace Processing:

Furnace Stack

RTA

Milan Begliarbekov, Ph.D.
Technical Cleanroom Manager, Nanofabrication Facility

mbegliarbekov@gc.cuny.edu

Contact

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